Cette page fournit une interface de navigation pour trouver toutes les valeurs d’une propriété et une page donnée. D’autres interfaces de recherche disponibles incluent la recherche de propriété, et le constructeur de requête ask.
Liste de résultats
- Finally, rinse the target with high-pressure, low-moisture argon gas. This step removes any residual particles that could cause arcing or defects during sputtering. +
- Repeat the cleaning process using a soft cloth soaked in alcohol. This helps to further eliminate any remaining residues and prepares the surface for rinsing. +
- Rinse the target thoroughly with deionized water to remove any solvent traces. After washing, place the target in an oven and dry it at 100°C for 30 minutes to ensure all moisture is evaporated. +
- Take a soft, lint-free cloth and soak it in acetone. Gently wipe the surface of the sputter target to remove oils, grease, and other contaminants. +
Français
English
Deutsch
Español
Italiano
Português